Microscopic thin film metrology and visualization by Imaging Spectroscopic Ellipsometry

Date: September 5th |

11 AM PDT (Los Angeles, US)

7 PM BST (London, UK)

8 PM CEST (Berlin, DE)

Venue: Online Webinar

The thickness and optical properties of thin films are critical to the performance and reliability of micro- and nanoelectronics devices. As features are constantly getting smaller, conventional methods cannot measure those properties on small structures.
Imaging ellipsometry provides a fast and non-destructive method for characterizing surfaces and films on micron-scale structures, making it a valuable tool for materials research and development. This talk will show the principle and procedures of imaging spectroscopic ellipsometry and some application examples.

Ferroelectricity is observed in hexagonal boron nitride(hBN) through control of the registry of stacked layers, which we explore through both amplitude-modulated and sideband Kelvin probe force microscopy (KPFM) on the Park FX40 automatic AFM.

A schematic of the formation of parallel stacked bilayer hBN is shown in addition to a contact potential difference map measured using sideband KPFM.

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Arash Mirhamed

Arash graduated in 2000 with a degree in Physics/Materials Science. He has been working in various departments in the imaging spectroscopic ellipsometry division of Accurion (now Park Systems) for 20 years.

Enriching your AFM data: KPFM high resolution imaging of ferroelectric domains with automated AFM

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