Effective Use of AFM by Researchers Webinar Series
A Synopsis of AFM Sample Preparation
Park Systems India
March 27, 2023 | 11:30AM (IST)
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Atomic Force Microscope (AFM) is an indispensable tool in the field on nanotechnology to map nanometre sized features and physical properties of the sample surface. AFM can be used to image different kinds of samples such as polymers, thin films, nano particles, metals, semi-conductors, ceramics, glass, and biological materials etc. Majority of these samples can be imaged under ambient conditions and follow a relatively simpler sample preparation procedure.
The sample must be firmly attached to the solid substrate since the AFM tip physically interacts and tracks the sample surface. So the knowledge of sample preparation becomes important to achieve best and accurate AFM images. It is also important to investigate the substate preparation on which the sample can be dispersed and adhered firmly.
Thus, AFM imaging fundamentally requires the substrate to be clean and optically flat as possible, the sample affixed on the substrate and substrate also fixed or firmly attached.
In this webinar we highlight the procedures of sample preparation for an AFM. These procedures are generally optimised for specific type of samples and if followed correctly can generate high resolution images on an AFM.
Attend the webinar and get the Park’s handbook of sample preparation procedures in AFM!
*To get this material, attendance of this webinar is required.
Sneak-peak of the user handbook
Topography
Semiconductor device
Scanning Conditions
- System: NX10
- Scan Mode: Conductive AFM
- Cantilever: CDT-Contr
(k=0.5N/m, f=20kHz)
- Scan Size: 11μm×11μm
- Scan Rate: 1Hz
- Pixel: 512×512
- Sample bias: -0.5V
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Dr. Ashutosh Valavade
Application Scientist, Park Systems India
Dr. Ashutosh Valavade is an Application Scientist for Park Systems India and has a high level of experience in handling materials science & biological Atomic Force Microscopes (AFM). He has completed his doctorate from University of Mumbai.
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